Electron Beam Induced Deposition and Etching: Fundamentals, Challenges and Nanotechnology–based Applications
نویسندگان
چکیده
منابع مشابه
Electron flux controlled switching between electron beam induced etching and deposition
Electron beam induced deposition EBID and etching EBIE are promising methods for the fabrication of three-dimensional nanodevices, wiring of nanostructures, and repair of photolithographic masks. Here, we study simultaneous EBID and EBIE, and demonstrate an athermal electron flux controlled transition between material deposition and etching. The switching is observed when one of the processes h...
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Focused electron beam induced deposition (FEBID) is a direct beam writing technique for nanoand micro-structures. By proper selection of the precursor gas, which is dissociated in the focus of the electron beam, different functionalities of the resulting deposits can be obtained. This contribution discusses nano-granular FEBID materials. Quite generally, nano-granular metals can be considered a...
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This article presents a study on the growth process for the template-based growth of TiO2 nanorods by sol electrophoretic deposition, through both experiment and simulation. Uniformly sized nanorods of approximately 45–200 nm in diameter and 10–60 μm in length can be grown over large areas with near unidirectional alignment. The nanorods have the desired stoichiometric chemical composition and ...
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BACKGROUND Focused electron beam induced deposition (FEBID) is a direct-writing technique with nanometer resolution, which has received strongly increasing attention within the last decade. In FEBID a precursor previously adsorbed on a substrate surface is dissociated in the focus of an electron beam. After 20 years of continuous development FEBID has reached a stage at which this technique is ...
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ژورنال
عنوان ژورنال: Microscopy and Microanalysis
سال: 2009
ISSN: 1431-9276,1435-8115
DOI: 10.1017/s1431927609099176